With the rapid development of semiconductor process technology, the chip line width has entered the nanometer level. At the same time, gaseous molecular contaminants (AMC) are also several orders of magnitude smaller than particulate contaminants, gradually replacing particulate contaminants as one of the key factors affecting the quality of the process. At the same time, gaseous molecular contaminants (AMC) are also several orders of magnitude smaller than particulate contaminants, gradually replacing particulate contaminants as one of the key factors affecting the industrial process yield. For the microelectronic semiconductor manufacturing industry, gaseous pollutants will endanger the key links of the production process, causing oxidation and erosion of the semiconductor crystal surface, resulting in a decrease in the amount of pollutants on the semiconductor crystal surface. For the microelectronic semiconductor manufacturing industry, gaseous pollutants will endanger the key links of the production process, causing oxidation and erosion of the semiconductor crystal surface, resulting in a decrease in the qualified rate of finished products. Therefore, the control of molecular-level air pollution in microelectronics plants is becoming more and more important.

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