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EDK 4500 EIMS enhanced ion migration spectrometer

EDK 4500 EIMS enhanced ion migration spectrometer

Working PrincipleIon Mobility Spectrometry (IMS) is an analytical technique based on ion-molecule interactions in a uniform electric field. The main advantages of this technique are: compact structure, high sensitivity (···...
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Working Principle

Ion Mobility Spectroscopy (IMS)is an analytical technique based on ion-molecule interactions in a uniform electric field. The main advantages of this technique are:compactness, high sensitivity (ppb-ppt level), fast response time (millisecond range), atmospheric pressure operation and the ability to separate isomers. A conventional IMS instrument consists of an ionization zone, a reaction zone, and a drift tube Schematic diagram of an ion mobility spectrometer

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Features and Advantages

Fab AMC Monitoring

环境空气 ppb 级别检测

TA, CI-, F-, NH??, VOC

High Sensitivity

Combined with the Orion 3100, 45 ports can be monitored

Real-time graphics software

Non-radioactive Plasma Ionization Source

Ion mobility spectrometry has the advantages of high sensitivity (ppb range), fast response time (milliseconds), compactness, operation at atmospheric pressure, and separation of isomers. In this short report, we demonstrate the sensitivity and fast response of IMS for the detection of complex hydrogen (HCI) and hydrogen fluoride (HF)

HCI and HF are small molecules with molar masses of 36.46 g/mol (HCI) and 20 g/mol (HF). Hydrochloric acid and gas fluoride are important compounds in the pharmaceutical, polymer, and petrochemical industries. Both chemicals are also important in the semiconductor industry. In many semiconductor applications, the presence of HCI and HF needs to be monitored at low ppb levels

Compare the HCI at 60 ppb with the HF at 85 ppb. It is clear from the figure on the right that these two compounds can be easily distinguished by EIMS The separating ability of IMS can be improved by decreasing the length of the ion-gate pulses However, an increase in separation leads to a decrease in sensitivity. On the other hand, the sensitivity can be increased by sacrificing the resolving power of IMS. All of these modifications can be easily implemented in the software, allowing the user to easily set the optimal parameters for HCI and HF detection.

EDK 4500 EIMS Enhanced Ion Migration Spectrometer

Technical parameters

. Depends on configuration

Sampling Points1-16-30-45
Analysis SettingsEIMS Detects TA, CI-, F-, NH4+, and VOC
Standard Range0-50, 0-100 ppb
Maximum Length of Sampling Tube130 meters<
Equipment conditionDry compressed air, 110-115-230 Vac 50/60 Hz
Communication InterfaceEthernet port, Modbus, Profibus
>Mounting19"Rack Mount
Dopingdepends on the gas detected
Software User InterfaceBuilt-in Control Software
Operating TemperatureOperating Temperature5-45°C
Dimensions.;">DimensionsRack 19"4U L 500mm
Weight

The Orion 3100 is a complete AMC system for the semiconductor industry

The Orion 3100 is a multi-point area monitoring system where gases are sequentially drawn into the analyzer or analyzed by gas sensors for concentration readings, and the number of sampling points can be configured according to user requirements. The Orion 3100 has alarm and reporting software and is based on years of experience

The Orion 3100 can output data from up to four to six analyzers or gas sensors using Ethernet, Modbus.RS232/RS485, or optional 4-20mA analog modules. Each analyzer has an internal computer (Linux OS) which can store data on the hard disk indefinitely and send real-time data to the data memory via digital (RS232) or Ethernet output. In addition, the analyzer can be controlled remotely via the Internet. This feature allows the user to operate the analyzer from anywhere with internet access using a web browser. This remote access allows bios-level control of the instrument and provides the opportunity to acquire data and diagnose instrument operation without having to be on-site

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Application range

Control software samples and analyzes TA, CIControl software samples and analyzes TA, CI-,F-, NH4?, VOC and other AMCs for automated real-time viewing and operation. This software program was written specifically for semiconductor equipment that monitors and controls air pollution during DUV lithography. The software is flexible and can be applied to any industrial setup that requires one or more analyzers for multipoint sampling. Features include simple interactive control of alarms, data logging, historical trending, and basic analyzer functionality in a Windows environment.
The software allows a quick view of the measurement points belonging to the current operator room;as these points are not the same as the current measurement points, they are not the same as the current measurement points. As the analysis of these points is done by EIMS, the target gas is detected simultaneously at each point. For each measurement point, the value of the last measurement can be seen, while the current measurement point is highlighted with its status. In addition, it is possible to see whether the system is measuring in manual or automatic mode, whether it is measuring a sample or in the background phase, which point of the automatic sequence is being scanned, and a progress bar indicating how much of the next step of the sequence remains.

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