Product Details:

Continuous Monitoring @ sub ppb level

Acetic Acid, Oxalic Acid, Amines, N-Methylpyrrolidone (NMP), Hexamethyldisiloxane (HMDS), Dioctyl Phthalate (DOP), Dibutyl Phthalate (DBP), and Dibutyl Bicarbonate (DBB). Dibutyl Phthalate (DBP), Diethyl Phthalate (DEP), Isopropyl Alcohol, Acetone, Trimethylene Vinyl Borate, Xylene, Triethyl Phosphate -and other organics

Airborne molecular contaminants (AMCs) are a critical factor in high-tech manufacturing processes, especially in microelectronics. Critical factors, especially in the microelectronics industry, organic pollutants are a negative factor in the production process and can lead to increased costs for high-tech companies due to product quality issues.

Airborne Molecular Contaminant (AMC)-free production is the ideal production goal, which is achieved by controlling contaminants at the source, controlling their spread, monitoring contaminant concentrations in real time, and combining multi-stage filters and fresh air systems to achieve a sustained monitoring of AMC concentrations, which can help to grasp the source of contaminants, stabilize production, prevent filters, and prevent contaminants. Stabilizing production at the source of pollutants and preventing sudden reductions in filter life.

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Ares-uVOC provides customers with a real-time, fast and continuous online air molecular pollutant AMC monitoring program with no sampling and offline measurements.

Limit of Detection (LOD) at sub-ppb level

Airborne molecular contaminants (AMCs) in the cleanroom environment come from internal sources such as releases from building materials, releases from equipment and materials, chemical escapes from processes such as corrosion and lithography, generation by personnel, leaks from piping, and emanations from maintenance and repairs of equipment, and from external sources such as gas-phase contaminants (GPCs) in the ambient air, and from the presence of gas-phase contaminants (GPCs) in the cleanroom environment. Pollutants, as well as clean room exhaust emissions back to the clean room.

Exceeding the AMC air molecular contaminant limits can lead to a number of serious consequences, such as wafer disposal, shutdowns, and cleanroom repurification.

Air molecular contaminant issues:from cleanroom to production machine processing

As the cost of IC product production increases, air molecular contaminants are becoming a major concern. cost of manufacturing IC products increases, monitoring of air molecular contaminants AMC is becoming increasingly important.

Contaminants diffuse from the process to the ultraclean room, and as the composition increases, molecular contaminants are coming from multiple sources, such as production chemicals.

Construction materials, cleanroom equipment and fixtures, and operators.

The Ares-uVOC System means the potential identification of airborne molecular contaminants with the potential to create and reduce pollution problems, complete with full-range, full-component, real-time, sub-ppb level measurements, providing early AMC monitoring and rapid identification of the causes of these pollution problems.

Featured benefits:

Online continuous quality monitoring of all automated systems™ lt;br style="text-align:left;"/>Low concentration VOC monitoring
Individual and separate measurement of organic constituents

Online continuous quality monitoring all automated system'

Sub-ppb detection limit

Integrated VOC monitoring quot;>Integrated computer and control software

as well as data acquisition and processing functions
Tracking pollutant sources through constituent formation:

Many manufacturing process chemicals become sources of contaminants, NH;most notably due to the photolithography process. Hexamethyldisilazane (HMDS) breaks down into trimethylsilanol and NH3, and many other similar chemical decompositions and releases, all of which contribute to the increase in AMC. The Ares-uVOC system, which rapidly measures the concentration of these constituents in real time, can track the timing and routing of pollutant formation.

Contaminant cross-talk is another cleanroom control challenge. In fact, due to the gas circulation within the cleanroom, an agent or solvent that is necessary for one process section may become a hazard or contaminant in a different process section. Thanks to the powerful multi-component, low concentration measurement capability of the Ares UVOC system, the cleanroom cross-talk problem is solved.

Real-time filter status monitoring:At the top of the fresh air air conditioning (MUA) and high efficiency filters (FFU) production machine, SWIF is installed. Below the installation of chemical filters, the actual production process of filter maintenance and replacement, if too early or too late will cause an increase in product costs and reduce efficiency, and even large production accidents, production stoppages.

The Ares-uVOC system with its 16 channels Allows monitoring of AMC concentrations of airborne molecular contaminants upstream and downstream of the filter, with sampling points located upstream of the intake system when incoming gases do not meet filtration criteria;and downstream when absorption capacity is depleted

Process Manufacturing Tools™ lt;/strong>:

The Ares-Designed for continuous monitoring and unattended operation, the uVOC system is a professional process analysis tool. 16 channels of sampling points can be set up for automatic sample feeding for analysis, with alarm settings for each channel, and mobile use makes the Ares uVOC system ideal for diagnosing airborne molecular pollutants AMCs.

Onboard calibration matches strict quality control rules.

Measurements are displayed in real-time with no calculations to run.

Comes standard with remote networking technical support for customers.

Technical Parameters:
Technical Parameters:

GC gas chromatography is a commonly used technique for separating a wide range of complex mixtures, which relies on a mixture of volatile organic gases in a color

multicomponent separation on a spectral column. When different VOCs are separated from the column, the change in conductivity is detected by a hydrogen/air flame ionization detector to determine the concentration of the different components. quot;/>

Working Principle:	GC-FID<
Measurement Range:<	0-200 ppb
Accuracy:	2%
2%<
Dimensions (HxWxD)	160cm x 60 cm x 80 cm
Protection Level	Protection Level	Nema 12 or IP54 stainless steel housing
Operating Temperature:		10°C-35°C
Communication:	™ lt;span style="color:rgb(0, 0, 0);">RS-232, Ethernet, ODBC
Power:	230Vac.50/60Hz 900W
	Designed for PCI Express Gen.
Sampling Channels:<	Up to 16
Resolution.	0.1 ppb
Measurement components:	Up to 30. 客户可定制

Applications:

Cleanroom Contaminant Monitoring

Filter Status Monitoring

Process Whole Component Measurement Diagnostic Contaminant

Measurable Component:

2-Aminoethanol CH3NHNH< letter-spacing:0pt;vertical-align:sub;">2CH2OH(t-butyl acetate)dihydroxytoluene H3CC66H3(t-C4Hg)2OH

2-Aminopropanol CH3NH2C2H4OH

Hexamethyldisilazane (CH3)3SiNHSi(CH3)3

Isopropanol (CH3 )2CHOH

Diethylaminoethanol (C2Hs)2NC2HsOH

Ethanolamine H2&. lt;/span>2&. letter-spacing:0pt;vertical-align:baseline;">NCH22CH2OHOH

Dioctyl phthalate C6H4(C=OOCgH15)2

Cyclohexylamine C6H11NH2<

Diethyl phthalate C6H4