Trace Level AMC Airborne Molecular Pollutant Ma Mb (NH3, HCL, HF, etc.) Monitoring -Semiconductor Industry Applications

Ultra-high sensitivity, real-time measurement of trace-level NH3, HCL, HF and other gases in lithography clean rooms has proven that the deep-ultraviolet lithography process is deeply affected by multiple types of trace pollutants, and is extremely sensitive to many trace pollutants, such as NH3, HCL, HF and other gases. Many trace contaminants are extremely sensitive, such as ammonia or acid gases can bring great harm to semiconductor production, although with the development of deep UV corrosion-resistant materials technology, has reduced the long time continuous real-time monitoring, and in fact, real-time measurement of air molecular contamination (AMC) is critical to the quality of the product.

The Orion 3100S Series Airborne Molecular Contaminant The monitoring system is based on CEAS (Cavity Enhanced Absorption Spectroscopy) technology continuous analysis instrumentation that will increase semiconductor device impedance uniformity, ensure longer filter life, and reduce production process downtime.

EDK developed software that allows for real-time observation, measurement, and manipulation of different pollutants in different spaces. The software is specially developed for the semiconductor industry to provide powerful support for monitoring and controlling air molecular contamination (AMC) during the deep UV lithography process. The software integrates the multi-point sampling (MS) control function and has the functions of real-time display of data curves, alarms, storage, trending, historical curves, and analysis.

Orion 3100 System:Complete Air Molecular Contaminant (AMC) Monitoring

Orion 3100 System. 12, 12);">Real-time monitoring of airborne molecular contamination (AMC) is extremely important for semiconductor manufacturing processes.

Rapid monitoring, alarms, very low concentration measurement The semiconductor industry requires a wide measurement area and a highly sensitive response to multiple gases. Deep UV lithography process is particularly concerned about the concentration measurement of ammonia, amines, N-methyl pyrrolidone NMP, acids, etc. When these gases and chemical amplification photoresist antibiotic reaction, will deeply affect the quality of semiconductor devices.

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DUKE solves AMC (Airborne Molecular Pollutant) monitoring challenges with proven CEAS (Cavity Enhanced Absorption Spectroscopy) technology for rapid measurement of trace levels of NH3, HCL, and HF, pulsed fluorescence for SO2, and enhanced GC-FID for VOCs.
The Orion 3100S Series Airborne Molecular Contaminant Monitoring System measures trace levels of NH3, HCL, HF and integrates the uVOC-CAM feature, making it a powerful tool for AMC (Airborne Molecular Contamination) measurements in cleanrooms for the semiconductor industry.
The Orion 3100S also incorporates a multi-point monitoring system that sequentially pumps gas to an analyzer or sensor and reads out the measurement. The Orion 3100S's embedded alarm, reporting, and analysis software was developed collectively by engineers with years of experience in the semiconductor industry.
The Orion 3100S can output data from 4 to 6 analyzers or sensors using Ethernet, RS485/RS232 or 4-20mA analog modules.
Each analyzer is equipped with a built-in computer (Linux OS) for data storage and data output, and also supports remote network control, which allows you to connect to DUKE's corporate headquarters or your local distributor's service provider via the Internet for operation or diagnosis.
Users can operate the device via web browsers such as IE, Chrome, etc. anywhere in the world where internet access is available, and remote operation can be achieved through multi-level administrative privilege control and operations.
Orion 3100S System Configuration

Features of Orion 3100S:

Sub-ppb level real-time measurements

CEAS (Cavity Enhanced Absorption Spectroscopy) Principle

Continuous Unattended Measurement in Harsh Hazardous Environments

No Reagents, No Radioactive Sources, No Paper Tape Consumption, No Absorbent Tubes or Other Consumables

Long-term stability and reliability

No moving parts in solid-state electronics
低维护量、长免维护期

Factory Calibrated

Single Component/Multi Component Trace Level Gas Measurement

Single Component/Multi Component Trace Level Gas Measurement

Single Component/Multi Component Trace Level Gases Measurement

Independently programmable alarms, relay settings
Independently programmable sampling point sequences and purging Channel
Open communication protocol for easy secondary development and integration
No data loss in case of power outage or sniffer break

The touch screen allows data display, table display, curve display, etc.

%"OD interface
Piping:PFA,PVDF
Longest pipeline from sampling point:80m
Panel-mounted color LCD monitor
Remote or visual operation
arbitrary carrier
Output Signal:Standard:RS232 Optional:4-20 mA,Modbus
Power supply:115-230 Vac 50/60 Hz
Calibration Report
Calibration Report
Sampling via Sampler or Fast Loop Pump

Technical parameters:

Enhanced Sensitivity:
The instrument is based on CEAS (Cavity Enhanced Absorption Spectroscopy) technology, which is simple to use and easy to operate, with all components (including built-in vacuum

pump, keyboard, mouse, monitor, etc.) can start recording data in minutes, and other atmospheric water vapor, CO2, O2, methane

, etc. can also be used.

transferring data through digital or analog interfaces, storing or recording data remotely through the Internet, and a high-quality database,

Suitable for demanding semiconductor trace gas applications.

Limit of Detection/Accuracy (1-σ)::

HCL     0.1ppb

HF     0.1ppb

NH?    <0.1ppb

Quick Response Time:每个通道5秒

System Plug and Play:The system can be simply operated in the cleanroom within minutes

Low Cost:Because the CEAS (Cavity Enhanced Absorption Spectroscopy) system requires no special maintenance or spare parts, it reduces the cost of the system by a significant amount

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User costs are minimized.

CEAS (Cavity Enhanced Absorption Spectroscopy)---Principle

Based on Schematic diagram of an instrument based on CEAS (Cavity Enhanced Absorption Spectroscopy) technology, which uses near-infrared wavelength light for high-sensitivity absorption measurements

The measurement chamber consists of a set of columns of highly reflective multiple reflector mirrors, and the laser beam passes through a solid-state calibrator.

(FSR=2.00GHz) is measured to obtain the relative laser wavelength. For clarity, the beam that would have been directed outside the left measurement

unit cavity mirror is ignored.

The enhanced version of the EP integrates a pressure sensor and an internal temperature controller with an ultra-stable measuring chamber that prevents errors caused by temperature drift

shifts, pressure variations, etc.

The EP is also available in a new version with an integrated pressure sensor and an internal temperature controller.

CEAS (Cavity Enhanced Absorption Spectroscopy) has a number of proven advantages over the first generation of CRDS (Cavity Swing Spectroscopy). Simply put, the laser beam does not need to be resonantly coupled into the measurement chamber (e.g. the beam does not need to be tightly aligned). DUKE analytical instruments and systems are inherently simple to install, mechanically robust, and ruggedly protected.